MoS2 monolayer film, continuous polycrystalline
| Size | 10×10 (mm) |
| Growth method | Chemical vapor deposition |
| Substrate | SiO2/Si |
MoS2 monolayer film, continuous polycrystalline
| Size | 10×10 (mm) |
| Growth method | Chemical vapor deposition |
| Substrate | SiO2/Si |
